D eff is the effective diffusion coefficient, and N 1 is the number of oxygen molecules incorporated per unit volume of the oxide layer. The coefficient A is independent of the partial pressure, leading to the linear rate constant B/A which linearly increases with oxygen flux as well.   In a similar manner, we propose that

the higher Si fluxes being generated via substrate oxidation now make it possible for higher rates of oxidation to occur Autophagy Compound Library mouse at heterogeneous defect sites including stacking faults and twins within the QD (Figure 1c,d) and hence cause it to ‘explode’ into multiple Ge fragments, almost identical in size to the as-oxidized Ge islands formed from the original SiGe nanopillars. With further silicon dioxide generation, the Ge ‘dew drops’ subsequently migrate outward, from the core of the original monolithic Ge QD from which they came with increasing time through the increase in the thickness of the SiO2 layers separating them. Eventually, Si atom diffusion from the substrate to the dew drops slows down as the oxide thickness between them and the substrate increases. This decreased supply of Si atoms results in the oxide layers between the dewdrops www.selleckchem.com/products/pci-34051.html achieving a limiting thickness of 4 to 8 nm (Figure 3c). Conclusion We have observed the unique and Crenolanib in vivo anomalous phenomenon of completely different Ge QD growth and migration

behaviors within Si3N4 layers versus within the Si

substrate during high-temperature oxidation. The Ge migration behavior and morphology change appears to be directly dependent on the Si flux generated during the oxidation of Si-containing layers. When the flux of Si is low (as in the case of the Si3N4), the Ge migrates as a large, spherical QD that grows at the expense of smaller Ge nuclei. In contrast, when the Si flux is high, as in the oxidation of the Si Branched chain aminotransferase substrate (enhanced by the formation of a thin SiGe shell), internal defect sites within the QD become activated as sites for Si oxidation, causing QD to explode and almost regress to its origins as smaller separated Ge nuclei. Acknowledgements This work was supported by the National Science Council of R. O. C. (NSC 101-3113-P-008-008 and NSC-99-2221-E-008-095-MY3). References 1. Ekimov AI, Onushchenko AA: Quantum size effect in three-dimensional microscopic semiconductor crystals. JETP Lett 1981,34(6):345–349. 2. Robledo L, Elzerman J, Jundt G, Atature M, Hogele A, Falt S, Imamoglu A: Conditional dynamics of interacting quantum dots. Science 2008,320(5877):772–775.CrossRef 3. Astafiev O, Inomata K, Niskanen AO, Yamamoto T, Pashkin YA, Nakamura Y, Tsai JS: Single artificial-atom lasing. Nature 2007,449(7162):588–590.CrossRef 4. Tiwari S, Rana F, Chan K, Shi L, Hanafi H: Single charge and confinement effects in nano-crystal memories.